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Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
EUV Masks EUV-Scatterometry Finite Element Analysis
2010/11/16
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective mas...
Infrared Analysis and Physical Properties Studies of B2O3 · CaO · ZnO · TiO2 Glass System
Infrared Analysis Differential Thermal Analysis Magnetic Susceptibility DC Electrical Conductivity and Physical Properties of Glass
2010/4/9
The glass system having (B2O3)0.60(CaO)0.25(ZnO)0.15-x (TiO2)x, where x = 0.0, 0.025, 0.05,..., 0.15, was investigated using infrared spectroscopy, differential thermal analysis, density, magnetic sus...